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Affordable reactive ion etching RIE in a compact, bench top configuration. The plasma etchers chassis, which also serves as an integrated safety enclosure, houses the plasma chamber, control electronics, Maintenance access is provided through an interlocked door or easily removed panels.
Featrues of Plasma Stripper. Plasma Stripper - Users and Uses. Pictures show of Plasma Stripper. Power supply:.
The sample holder is water cooled at 20 degrees C. The system is Cryo Pumped with a base pressure in the torr range. It is ICP powered
Semiconductor device production processes are getting more complicated in order to achieve high performance, and lithography is one of the key processes for next-generation devices. Related with the lithography process, photoresist removal after etching or ion implantation is a critical process in device production. These technologies can be used not only for general photoresist stripping but also for removal of post-etch polymer residue, which is formed as by-product during plasma etching process.